| 摘要 |
<p>Minature capacitors formed by sputtering metal electrodes onto cleaved (8-10 mu) mica film. The sputtering target consists of an alloy of Au plus 2% of an oxidisable metal (Ni or Co). On sputtering in a reduced pressure rare gas containing a small amount of oxygen, a layered structure of Ni or Co oxide/oxide - Au mixture/Ni-Au or Co-Au alloys is formed. the thin oxide film improves adherence to the mica. Alternatively a two-target technique can be used. Finally a thicker layer of Cu, Ni, Sn or Au is deposited electrolytically. The capacitors can be soldered directly to microcircuits operate at 20-30 GHz, and have capacitances of 7-8pF/mm2.</p> |
