Compounds for forming alumina films using chemical vapor deposition method and process for preparing the compound

摘要

Organometallic compounds useful for forming aluminum films by chemical vapor deposition are disclosed. Also disclosed are methods of preparing the organometallic compound and methods of forming aluminum films. The compounds are selected from R'R''R'''Al:Ln wherein R', R'', R''' are independently selected from alkyl, perfluroalkyl or alkoxy or borate. L is one or more organic Lewis bases selected from thiophene, thriopyran and,oras defined in the instant specification.