发明名称 |
PRESSURE CONTROLLING DEVICE OF CHAMBER USING MULTI NOZZLE EJECTOR |
摘要 |
PURPOSE: An apparatus for controlling the pressure of a chamber by using a multinozzle ejector is provided to improve productivity and production yield, by decreasing the interval of time for a wet oxidation process of a gallium arsenic wafer by half. CONSTITUTION: Nitrogen and deionized water are supplied from one side of the chamber to the inside of the chamber(C), and a predetermined pressure is supplied to the inside of the chamber from the other side of the chamber. The multinozzle ejector(240) sprays air to supply a uniform pressure to the inside of the chamber, connected to the other side of the chamber and capable of controlling the pressure of the chamber.
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申请公布号 |
KR20020095832(A) |
申请公布日期 |
2002.12.28 |
申请号 |
KR20010034082 |
申请日期 |
2001.06.16 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
EO, SEONG CHAN;KANG, SEOK MYEONG |
分类号 |
H01L21/02;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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