发明名称 POLYIMIDE FILM EXCELLENT IN ALKALI ETCHING PROCESSABILITY AND PUNCHABILITY
摘要 <p>A polyimide film which satisfies at least either of the following requirements: (1) the dispersion of tear propagation resistance, CH, is 1.0 g or less; and (2) the coefficient of sliminess after immersion in an alkali solution, CR, is 20.0 or less. Since the polyimide film satisfies the requirement(s), it can have improved processability. The occurrence of processing failures can be effectively prevented even during etching or punching. Thus, the productivity in each step can be improved.</p>
申请公布号 WO2002102883(P1) 申请公布日期 2002.12.27
申请号 JP2002006022 申请日期 2002.06.17
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