发明名称 MANUFACTURING METHOD FOR NON-LINEAR ELEMENT, MANUFACTURING METHOD FOR OPTOELECTRONIC DEVICE, OPTOELECTRONIC DEVICE AND ELECTRONIC INSTRUMENT
摘要 <p>PROBLEM TO BE SOLVED: To provide a manufacturing method for a non-linear element whose non-linearity can be further enhanced and to provide an optoelectronic device and an electronic device. SOLUTION: When an element substrate 20 of a liquid crystal device is formed, after a base layer 61 is formed on the surface of the element substrate 20 in a base layer forming stage (a), a first metal layer 62 consisting of a metal film containing at least Ta is formed in a first metal film forming stage (b). An insulation film 63 is formed on the surface of the first metal film 62 by subjecting the first metal film 62 to high pressure annealing treatment in an atmosphere containing steam in an insulating film forming stage (c). A second metal film is formed on the surface of the insulation film 63 in a second metal film forming stage to manufacture the non-linear element.</p>
申请公布号 JP2002372725(A) 申请公布日期 2002.12.26
申请号 JP20020070958 申请日期 2002.03.14
申请人 SEIKO EPSON CORP 发明人 WATANABE YOSHITADA;SEKI TAKUMI;NAONO HIDEAKI;TAGUCHI SATOSHI
分类号 G02F1/1333;G02F1/1365;H01L45/00;H01L49/02;(IPC1-7):G02F1/136 主分类号 G02F1/1333
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