发明名称 |
Buried channel in a substrate and method of making same |
摘要 |
A buried channel and a method of fabricating a buried channel in a substrate including depositing a layer of masking material onto a surface of a substrate, etching a groove in the masking layer, etching a channel into the substrate through the groove, and depositing a cover layer over the masking layer and groove such that the covering layer at least substantially closes over the groove.
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申请公布号 |
US2002197802(A1) |
申请公布日期 |
2002.12.26 |
申请号 |
US20010892920 |
申请日期 |
2001.06.26 |
申请人 |
BAHL SANDEEP;SEAWARD KAREN L. |
发明人 |
BAHL SANDEEP;SEAWARD KAREN L. |
分类号 |
B81B1/00;(IPC1-7):H01L21/336;H01L21/476;H01L21/76 |
主分类号 |
B81B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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