发明名称 |
Method and apparatus for inspecting a semiconductor device |
摘要 |
A method and its apparatus for inspecting a semiconductor device in which failure occurrence conditions on a whole wafer are estimated by calculating the statistic of potential contrasts in pattern sections from sampled images to implement higher throughout and defective conditions of process are detected at an early stage with the help of time series data of the estimated result.
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申请公布号 |
US2002195574(A1) |
申请公布日期 |
2002.12.26 |
申请号 |
US20010942213 |
申请日期 |
2001.08.30 |
申请人 |
TANAKA MAKI;WATANABE MASAHIRO;WATANABE KENJI;NOZOE MARI;MIYAI HIROSHI |
发明人 |
TANAKA MAKI;WATANABE MASAHIRO;WATANABE KENJI;NOZOE MARI;MIYAI HIROSHI |
分类号 |
G01R31/302;G01N23/225;G01Q20/04;G01Q30/04;H01L21/027;H01L21/66;(IPC1-7):G21G5/00 |
主分类号 |
G01R31/302 |
代理机构 |
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代理人 |
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地址 |
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