发明名称 |
Mold release film for sealing semiconductor element and sealing method for semiconductor element using it |
摘要 |
Provided by the present invention is a mold release film for sealing a semiconductor element, which does not deform or cause deformation of the terminals of the semiconductor and which has good releasability during the semiconductor element sealing process, and a sealing method for a semiconductor element using the mold release film, which can improve efficiency of manufacturing a semiconductor. Disclosed is a mold release film for sealing a semiconductor element, comprising a single layer or a plurality of layers containing a thermoplastic resin and satisfying the following (1)-(4) requirements, and a sealing method for a semiconductor element using the mold release film: (1) a wetting index of a front surface layer of the mold release film is 36 or less; (2) a heat shrinkage rate of the mold release film at 175C. is less than 3 percent; (3) a modulus of elasticity of the mold release film at 175C. is in the range of 10-500 MPa; and (4) a thickness of the mold release film is in the range of 10-300 mum. |
申请公布号 |
US2002195744(A1) |
申请公布日期 |
2002.12.26 |
申请号 |
US20020148186 |
申请日期 |
2002.06.06 |
申请人 |
OTSUKI YUSUKE;YAMATO HIROYASU;ISOGAI OSAMU |
发明人 |
OTSUKI YUSUKE;YAMATO HIROYASU;ISOGAI OSAMU |
分类号 |
B29C33/12;B29C33/68;B29C43/18;B29C45/14;C08J5/18;C08K3/00;C08K5/00;C08L7/00;C08L9/00;C08L25/06;C08L101/00;H01L21/56;(IPC1-7):B29C70/72 |
主分类号 |
B29C33/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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