| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology for transferring a wafer, while protecting against contamination, from a cleaning tank in the finish stage or in the prestage thereof using one transfer finger. SOLUTION: A wafer cleaning system comprising a robot for transferring a wafer between a plurality of tanks for cleaning the wafer while clamping at a specified position and a specified inner or outer position is further provided with a tank 9 for cleaning the finger part 41 of the wafer transfer robot for mounting the wafer with cleaning liquid wherein the cleaning liquid is cut by blowing clean air toward the finger part 41 after cleaning. |
