| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a pattern layout method wherein the enhancement of design accuracy, shortening of a designing period, and reduction of design error are made possible by creating an exposure pattern to be transferred onto a substrate by exposure. SOLUTION: Part of each reticle pattern 15 which does not overlap a light shielding band pattern 16 is extracted, and an exposure pattern 23 to be transferred onto a substrate by an aligner is created. If there is such a defect that the light shielding band pattern 16 overlaps a reticle pattern 15, that can be immediately detected from the exposure pattern 23. Thus, the enhancement of design accuracy, shortening of a designing period, and reduction of design error are possible.</p> |
