SUBSTRATE PROCESSING EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide an equipment which enables to dry up a plurality of substrates after dipped in a processing liquid rapidly without generating water stain. SOLUTION: A megasonic nozzle 32 is provided which blows out IPA aerosol against a wafer W which has just been drawn out of pure water 12 in a processing bath 10. A driving motor 38 is also provided which moves the megasonic nozzle laterally above a plurality of wafers held by a holder section 26 of a lifter 24.