发明名称 Exposure apparatus and method
摘要 Single-wavelength laser light of from visible to infrared range generating from a DFB semiconductor laser is amplified by a fiber optical amplifier, and the amplified laser light is converted to illumination light of ultraviolet range by a wavelength converting portion. To detect optical characteristics of an optical system, of an exposure apparatus, through which exposure light passes, the illumination light illuminating a mark for evaluation is detected by an photo detector through the optical system. The output signal of the photodetector is normalized by an integrated energy on a plurality of pulse basis.
申请公布号 US2002191171(A1) 申请公布日期 2002.12.19
申请号 US20020223627 申请日期 2002.08.20
申请人 NIKON CORPORATION 发明人 NISHI KENJI
分类号 H01L21/027;G03B27/54;G03F7/20;(IPC1-7):G03B27/54 主分类号 H01L21/027
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