METHOD OF FORMING COATING FILM

摘要

PROBLEM TO BE SOLVED: To improve the film thickness distribution occurring in the revolution direction of a substrate in a method of forming a coating film. SOLUTION: In applying a coating raw material from a vaporization source 3 arranged at a prescribed interval from the substrate on the surface of the substrate 2 while rotating the substrate 2, the coating film is applied on the surface of the substrate 2 in a condition that the radius of curvature of the substrate obtained by bending the substrate within a elastic range agrees with the revolution radius of the substrate 2.