POLISHING PAD INCLUDING MICRO PORES AND METHOD OF FABRICATING THE SAME

摘要

PURPOSE: A polishing pad including micro pores and a method of fabricating the same are provided to improve productivity by controlling uniform distribution of voids in a polishing pad matrix, and prevent deviation of polishing property between rots of the polishing pad. CONSTITUTION: The polishing pad includes inorganic voids comprising the outside of an organic inner shell coated with an inorganic material and the inside of the organic inner shell with voids, and a polymer including the inorganic voids.