| 摘要 |
PROBLEM TO BE SOLVED: To provide a wet sheet treatment device free from the generation of unevenness of substrate processing. SOLUTION: This wet sheet treatment device is provided with a carrier roller 18 for carrying a substrate 1, and a shower part 3 discharging a substrate treatment liquid toward the substrate 1. The wet sheet treatment device is also provided with a treatment liquid discharge part 10, which receives the falling treatment liquid and discharges it to the outside of a treatment tank 20, and an upper opened liquid storage pan 4, which is located between the carrier roller 18 and the treatment liquid discharge part 10 and stores the treatment liquid dropping down from the substrate 1. The temperature of the substrate 1 is regulated by radiant heat emitted from the treatment liquid stored in the liquid storage pan 4.
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