发明名称 Method for forming a capacitor compatible with high dielectric constant materials having two independent insulative layers
摘要 The invention is a storage cell capacitor and a method for forming the storage cell capacitor having a storage node electrode comprising a barrier layer interposed between a conductive plug and an oxidation resistant layer. A thick insulative layer protects the sidewalls of the barrier layer during the deposition and anneal of a dielectric layer having a high dielectric constant. The method comprises forming the conductive plug in a thick layer of insulative material such as oxide or oxide/nitride. The conductive plug is recessed from a planarized top surface of the thick insulative layer. The barrier layer is then formed in the recess. The process is continued with a formation of a second insulative layer, a potion of which is removed to form an opening exposing a portion of the barrier layer. An oxidation resistant conductive layer is deposited in the recess and forms at least a portion the storage node electrode of the capacitor. Next a dielectric layer having a high dielectric constant is formed to overly the storage node electrode and a cell plate electrode is fabricated to overly the dielectric layer.
申请公布号 US6495427(B2) 申请公布日期 2002.12.17
申请号 US19990357634 申请日期 1999.07.20
申请人 MICRON TECHNOLOGY, INC. 发明人 FAZAN PIERRE C.;SANDHU GURTEJ S.
分类号 H01L21/02;H01L21/768;H01L21/8242;H01L21/8246;H01L27/115;(IPC1-7):H01L21/20;H01L21/824 主分类号 H01L21/02
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