| 摘要 |
PROBLEM TO BE SOLVED: To obtain a projection aligner having high position detecting accuracy and a position detector in which offset between processes is suppressed. SOLUTION: The projection aligner comprises a photoelectric conversion element, and a position detecting optical system for illuminating an object to be detected with light from a light source and focusing reflected light from the object onto the photoelectric conversion element wherein the position of the object is detected based on an image signal detected by the photoelectric conversion element and a wafer is aligned by the detected position of the objected. The position detecting optical system has aberration and the center of gravity of light intensity distribution on the pupil face of the position detecting optical system illuminating the object is set to cancel asymmetry due to aberration of the image signal of the object.
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