SUBSTRATE ELECTRODE OF PLASMA PROCESSING UNIT AND METHOD FOR SURFACE-TREATING AND EVALUATING SUBSTRATE ELECTRODE

摘要

PROBLEM TO BE SOLVED: To reduce defective parts of an oxidation film in the substrate electrode of a plasma processing unit. SOLUTION: The substrate electrode 11 of a plasma processing unit comprises a parent material 22 of aluminum, and an oxidation film 23 formed thereon. The substrate electrode 11 is provided, in a defective part 23a extending from the surface of the oxidation film 23 to the surface of the parent material 22, with a barrier layer 24 formed from the surface of the parent material 22 to the surface side of the oxidation film 23 in order to seal the defective part 23a.