APPARATUS OF ELECTRON EMISSION LITHOGRAPHY USING SELECTIVELY GROWN CARBON NANOTUBE AND LITHOGRAPHY METHOD THEREOF

摘要

PURPOSE: An apparatus of electron emission lithography and a lithography method thereof are provided to exactly control line-width and to improve a throughout by using a selectively grown carbon nanotube as an electron emission source of lithography. CONSTITUTION: A plurality of carbon nanotubes(11) are formed on a substrate(12). Electrons are emitted from the carbon nanotubes(11) by applying a desired voltage to the substrate(12) having carbon nanotubes(11) via a voltage supply part(16). The emitted electrons are reached to a sample(14) formed oppositely to the substrate(11) by applying a magnetic field to the emitted electrons. At this time, e-beam resists(15,15') are formed on the sample(14) by controlling the intensity of the magnetic field applied in accordance with the spaced distance between the e-beam resists(15,15') and the carbon nanotubes(11). The e-beam resists(15,15') are developed by lithography.