| 摘要 |
PURPOSE: An apparatus for developing the exposed mask and a developing method are provided, to prevent the undeveloping due to bubbles by rotating a mask in a developer bath slowly, thereby improving the uniformity of the line width of a mask. CONSTITUTION: The apparatus comprises a chuck(40) for allowing the exposed surface of a mask(20) to face the lower direction; and a developer bath(50) which is placed below the chuck and contains a liquid injection hole(60) at the side and a developer ejection hole(70) at the center. The method comprises the steps of loading a mask(20) on the chuck(40) to face the exposed surface of the mask to the lower direction; dipping the loaded mask into a developer(80) and rotating it to develop it; and ejecting the developer through the developer ejection hole(70) after developing with injecting a rinsing liquid through the liquid injection hole(60). |
