发明名称 |
Exposure apparatus and reflection type mask to be used in the same |
摘要 |
A reflection type mask includes a reflective portion having a multilayered film, a non-reflective portion having an absorbing material and being formed on the multilayered film, and a non-reflective portion being defined by destroying the multilayered film. <IMAGE> |
申请公布号 |
EP0671658(B8) |
申请公布日期 |
2002.12.11 |
申请号 |
EP19950301087 |
申请日期 |
1995.02.21 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
WATANABE, YUTAKA;HAYASHIDA, MASAMI |
分类号 |
G03F1/00;G03F7/20;G03F9/00;G21K1/06;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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