发明名称 METHOD AND DEVICE FOR SIMULATING CHARACTERISTICS OF SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To shorten measuring time and to suppress the storage capacity of a data base to be a minimum, by highly precisely reproducing the electrical characteristics of a semiconductor element, based on a minimum measurement point. SOLUTION: A characteristic simulation device uses a MOS transistor model parameter. The device is provided with a data measuring means 1 taking in measurement data, a function-fitting means 2 for deciding the shape of a private function form measurement data which is fetched, a characteristic calculating means 3 calculating the electrical characteristics of drain current-drain voltage by using the decided function and a data output means 4 for outputting a calculation result by the characteristic calculation means. The function-fitting means 2 sets specified gate voltage and substrate voltage and decides the function reproducing the drain current-drain voltage characteristics at every specified gate voltage and substrate voltage through adjustment, by using multiple pieces of measurement data and a non-linear least squares method.
申请公布号 JP2002353440(A) 申请公布日期 2002.12.06
申请号 JP20010089147 申请日期 2001.03.27
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 发明人 BABA TOSHISUKE
分类号 G01R31/28;G06F17/50;H01L21/336;H01L29/00;H01L29/78;(IPC1-7):H01L29/78 主分类号 G01R31/28
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