发明名称 ADVANCED METHOD FOR COVERING A SUPPORT, DEVICE AND STRUCTURE ASSOCIATED THEREWITH
摘要 The invention relates to a method for covering a support (30) with a layer of particles arising from a target entity (20), said method comprising the implementation of an ion source (10) for directing an ion beam (100) towards said target entity in order to create a particle flux (F) arising from the interaction between the ion beam and the target entity, with a view to depositing at least one part of the particle flux on the support, characterized in that the method involves setting the ion beam into motion between the ion source and the target entity in order to scan the target entity in such a way that coverings are created, said coverings having a controlled thickness according to a desired profile.The invention also relates to a structure and a filter made according to said method.
申请公布号 WO02097156(A1) 申请公布日期 2002.12.05
申请号 WO2002FR01829 申请日期 2002.05.31
申请人 XENOCS;HOGHOJ, PETER 发明人 HOGHOJ, PETER
分类号 C23C14/46;G03F1/00;G03F1/24 主分类号 C23C14/46
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