发明名称 CERIUM OXIDE SLURRY, AND METHOD OF MANUFACTURING SUBSTRATE
摘要 A problem to be solved is to provide a slurry that is capable of flattening an uneven film on a substrate with good precision, and that has good stability, not separating into two layers, solidifying through flocculated settling or undergoing changes in viscosity. This problem is solved by adding poly ammonium acrylates having different degrees of neutralization to one another as surfactants to a cerium oxide slurry containing cerium oxide particles, and suitably adjusting the total amount of polyacrylates added.
申请公布号 WO02096999(A1) 申请公布日期 2002.12.05
申请号 WO2002JP05066 申请日期 2002.05.24
申请人 EKC TECHNOLOGY K.K.;NOJO, HARUKI;YOSHIDA, AKITOSHI;BERAR, PASCAL 发明人 NOJO, HARUKI;YOSHIDA, AKITOSHI;BERAR, PASCAL
分类号 B24B37/00;C09G1/02;C09K3/14;H01L21/304;H01L21/306;H01L21/3105 主分类号 B24B37/00
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