发明名称 |
OPTICAL SYSTEM AND EXPOSURE SYSTEM PROVIDED WITH THE OPTICAL SYSTEM |
摘要 |
An optical system having a good optical performance without being practically affected by double refraction even if an optical material having an intrinsic double refraction, such as fluorite, is used. The optical system comprises a fifth−group light transmitting member having a feature of practically transmitting light with a wavelength of up to 200 nm and being formed to have an optical axis aligned with a crystal axis [110] or a crystal axis practically optically equivalent to the crystal axis [110], and a sixth−group light transmitting member having a feature of practically transmitting light with a wavelength of up to 200 nm and being formed to have an optical axis aligned with a crystal axis [110] or a crystal axis practically optically equivalent to the crystal axis [110]. The fifth−group light transmitting member and the sixth−group light transmitting member are so related in position as to be rotated about 90° from each other around an optical axis.
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申请公布号 |
WO02097508(A1) |
申请公布日期 |
2002.12.05 |
申请号 |
WO2002JP05245 |
申请日期 |
2002.05.29 |
申请人 |
NIKON CORPORATION |
发明人 |
OWA, SOICHI;SHIRAISHI, NAOMASA;OMURA, YASUHIRO;TANAKA, ISSEI |
分类号 |
G02B13/24;G02B1/02;G02B5/30;G02B13/14;G02B27/28;G03F7/20;H01L21/027;(IPC1-7):G02B13/24 |
主分类号 |
G02B13/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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