METHOD FOR FABRICATING THREE-DIMENSIONAL MICRO ANTENNA USING ULTRA LOW-SPEED GRADIENT ROTARY EXPOSURE

摘要

PURPOSE: A method for fabricating a three-dimensional micro antenna using ultra low-speed gradient rotary exposure is provided to simplify a fabrication process of a structure of three-dimensional micro antenna and a waveguide by using a MEMS(Micro Electro Mechanical System). CONSTITUTION: A sacrificial oxide layer is formed on a semiconductor substrate(100). The first photoresist layer is deposited thereon. The first photoresist layer pattern is formed by using an exposure mask. The first metal layer is deposited thereon. The first photoresist layer pattern is exposed by polishing the first metal layer. A micro structure(110) is formed by removing the sacrificial oxide layer. A polymer layer is deposited on a whole surface of the above structure. The second photoresist layer is deposited thereon. The second photoresist layer pattern is formed by performing a patterning process. A round is formed on a surface of the polymer layer. The second metal layer is deposited thereon. The round of the second metal layer is removed by performing a polishing process. The third metal layer and the third photoresist layer are deposited thereon. The third photoresist layer pattern and the third metal layer pattern are formed by performing the patterning process. The third photoresist layer pattern is removed. A polymer layer pattern is formed. The fourth metal layer(124) is deposited thereon by using an electroless plating method. The third metal layer pattern and the polymer layer pattern are removed from the semiconductor substrate(100) by performing a plasma asher process.