| 摘要 |
PROBLEM TO BE SOLVED: To obtain a developing method in which trouble that the uniformity of developing is deteriorated by requiring much time for the built-up of developer being the demerit of a paddle developing system is eliminated, trouble that the surface of resist is damaged due to the force-feeding of the developer is inexpensively and easily eliminated, and also the demerits of a dip developing system and a spray developing system are eliminated. SOLUTION: Developing is performed by immersing a base plate to be processed 13 in the developer 12 in a state where the pattern surface 13A of the plate 13 is set as an upper surface and kept level to the surface of the developer 12 and then drawing up the plate 13 from the developer 12 while maintaining the level of the pattern surface 13A so that the developer 12 is built up on the pattern surface 13A. |
