| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for rapidly forming thin film of crystalline titanium oxide. SOLUTION: The method for manufacturing a thin film of crystalline titanium oxide on the substrate, which shows a highly photocatalytic activity, with a sputtering method employing a metallic titanium target, is characterized by employing a sputtering equipment having an electric power of 1 kW or higher, and an infused energy of 5 W/cm<2> or higher, and a sputtering equipment having an electric power of 30 kW or lower and the infused energy of 50 W/cm<2> or lower, to form the film having catalytic activity with thickness around 170 nm but thicker than 25 nm, in dozens of seconds to several minutes.
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