| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material less liable to fog in raw stock preservation, having such resistance that it is free of scuffing in printing on a PS plate, less liable to cause unevenness in density in printing on the PS plate and having such performance as to make an image less peelable even when a tape is stuck and peeled after development if necessary, and to provide a method for forming an image in the heat developable photosensitive material, and a mask material obtained by exposure. SOLUTION: In the heat developable photosensitive material containing a binder, an organic silver salt, silver halide and a reducer in one or more image forming layers on one side of the base in a distributed state, a change in the maximum surface roughness (Rt) of the side with the image forming layers before and after heat development is <1.5μm.
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