发明名称 |
Nitride light-detector with a low dislocation density |
摘要 |
<p>A semiconductor light-detecting element includes a given substrate, an underlayer and a light-detecting element structure which are formed on said substrate in turn. The underlayer is made of a nitride semiconductor including Al element with a dislocation density of 10<11>/cm<2> or below. The light-detecting element structure is made of a nitride semiconductor layer group including Al element at a larger content than the nitride semiconductor making the underlayer with a dislocation density of 10<10>/cm<2> or below.</p> |
申请公布号 |
EP1263057(A1) |
申请公布日期 |
2002.12.04 |
申请号 |
EP20020011379 |
申请日期 |
2002.05.23 |
申请人 |
NGK INSULATORS, LTD. |
发明人 |
SHIBATA, TOMOHIKO;ASAI, KEIICHIRO;SUMIYA, SHIGEAKI;TANAKA, MITSUHIRO |
分类号 |
H01L31/10;H01L33/00;H01L21/02;H01L21/20;H01L31/0304;H01L31/105;H01L31/18;(IPC1-7):H01L33/00 |
主分类号 |
H01L31/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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