发明名称 Nitride light-detector with a low dislocation density
摘要 <p>A semiconductor light-detecting element includes a given substrate, an underlayer and a light-detecting element structure which are formed on said substrate in turn. The underlayer is made of a nitride semiconductor including Al element with a dislocation density of 10<11>/cm<2> or below. The light-detecting element structure is made of a nitride semiconductor layer group including Al element at a larger content than the nitride semiconductor making the underlayer with a dislocation density of 10<10>/cm<2> or below.</p>
申请公布号 EP1263057(A1) 申请公布日期 2002.12.04
申请号 EP20020011379 申请日期 2002.05.23
申请人 NGK INSULATORS, LTD. 发明人 SHIBATA, TOMOHIKO;ASAI, KEIICHIRO;SUMIYA, SHIGEAKI;TANAKA, MITSUHIRO
分类号 H01L31/10;H01L33/00;H01L21/02;H01L21/20;H01L31/0304;H01L31/105;H01L31/18;(IPC1-7):H01L33/00 主分类号 H01L31/10
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