发明名称 Semiconductor memory device and method for fabricating the same
摘要 A semiconductor memory device and method of fabricating the same, which improves adhesion of the lower electrode of a ferroelectric planar capacitor, and prevents inter-diffusion between the Pt electrode of the capacitor and adhesion layer placed under the Pt electrode. The semiconductor memory device includes an insulating layer formed on a substrate, a paraelectric layer formed on the insulating layer, and a conductive layer formed on the paraelectric layer.
申请公布号 US6489644(B1) 申请公布日期 2002.12.03
申请号 US20000635437 申请日期 2000.08.11
申请人 LG SEMICON CO., LTD. 发明人 SEON JEONG MIN
分类号 H01L27/11;H01L21/02;H01L21/8242;H01L21/8244;H01L21/8246;H01L27/105;H01L27/108;H01L27/115;(IPC1-7):H01L29/76;H01L29/94;H01L21/824 主分类号 H01L27/11
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