| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum treatment method and a vacuum treatment apparatus which can attain improved device characteristics by reducing the intrusion of contaminations and dust into a pipe and can realize an improved device characteristics and an improved throughput by shortening the time required for steps including purge, etc. SOLUTION: According to the vacuum treatment apparatus, in the case in which a vacuum container 100 does not need to be fed with a raw material gas during, for example, maintenance, the container 100 can be separated from a raw material gas feed means 200 by removing a connection mechanism 300. During that time the intrusion of air or dust into a pipe can be prevented by releasing an inert gas from a cylinder 245 into a connection mechanism 300B.
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