| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which is able to restrain the transfer of a particle when lifting a substrate from a deionized water. SOLUTION: A carrier robot TR conveys a plurality of substrates W to each processing tank (chemical tanks CB1 and CB2, water washing tanks WB1 and WB2, multi-function tank MB and a low pressure drying part LPD) as lots. The conveying order is decided in advance, and a surface washing processing of a substrate W with SC2 (hydrochloric hydrogen preoxide mixed water solution) is conducted before a surface processing with hydrofluoric acid. By doing so, a chelate-forming metal adhered to the substrate W is dissolved by acid. As a result, a metal ion, and a silicon oxide, which is an etching residue, do not combine together even when a etching processing of a silicon oxide film is conducted by soaking the substrate W into the hydrofluoric acid; the forming of particles can be prevented; and the particle transfer when lifting the substrate W from the deionized water can be restrained.
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