发明名称 |
Positive resist composition |
摘要 |
The present invention provides a positive electron beam or X-ray resist composition containing (a) a compound which generates an acid by the irradiation with radiation and (b) a compound having a cationic polymerizable function. The positive electron beam or X-ray resist composition is high sensitivity, has high resolution, can provide an excellent rectangular pattern profile, and is excellent in PCD stability and PED stability.
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申请公布号 |
US6489080(B2) |
申请公布日期 |
2002.12.03 |
申请号 |
US19990449899 |
申请日期 |
1999.12.02 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
UENISHI KAZUYA;FUJIMORI TORU;KODAMA KUNIHIKO;SHIRAKAWA KOJI;TAN SHIRO |
分类号 |
H01L21/027;G03F7/004;G03F7/039;(IPC1-7):G03F7/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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