| 发明名称 |
AUXILIARY HEAT-RETENTION JIG, ITS MANUFACTURING METHOD, WAFER BOAT WITH HEAT INSULATOR IN PLATE FORM, VERTICAL HEAT TREATMENT EQUIPMENT, METHOD FOR MODIFYING THE SAME AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an auxiliary heat-retention jig necessary for modifying a fast thermal process system of medium temperature type into a fast thermal process system of high temperature type. SOLUTION: The auxiliary heat-retention jig 1 is placed between a wafer boat 4 and a heat-retention jig 2. The auxiliary heat-retention jig 1 is provided with vertically arranged several heat insulators 7 in plate form. The heat insulators 7 are formed of opaque quartz.</p> |
| 申请公布号 |
JP2002343789(A) |
申请公布日期 |
2002.11.29 |
| 申请号 |
JP20010145956 |
申请日期 |
2001.05.16 |
| 申请人 |
MITSUBISHI ELECTRIC CORP;OMIYA KASEI KK |
发明人 |
MINAMI SHINJI;KATSURADA IKUO |
| 分类号 |
F27D3/12;C30B31/14;H01L21/22;H01L21/31;H01L21/324;H01L21/673;H01L21/683;(IPC1-7):H01L21/31;H01L21/68 |
主分类号 |
F27D3/12 |
| 代理机构 |
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代理人 |
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| 主权项 |
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