| 摘要 |
PURPOSE: A gas supply device for preventing a glogging phenomenon from a CVD(Chemical Vapor Deposition) chamber is provided to prevent processing errors by heating a vaporized process gas. CONSTITUTION: A lower portion of a process manifold(100) is combined with upper screws(101,102) of a center manifold(200). A clean manifold(300) is combined with a back side of the center manifold(200) by a screw(304). A base plate(400) is combined with a bottom face of the center manifold(200). A mask(500) is installed on a bottom of the base plate(400). A chuck(600) is installed under the mask(500). A wafer(601) is loaded on the chuck(600). The center manifold(200) is formed with a ceramic material. Two gas port holes(205,206) and a water path hole(207) are formed on an upper face of the center manifold(200). A plurality of O-rings(201,202,203) are inserted into the gas port holes(205,206) and the water path hole(207), respectively. A water supply hole(103) is formed in front of the process manifold(100). A clean gas supply hole(301) is formed in front of the clean manifold(300). An O-ring(302) is inserted into the clean gas supply hole(301). A gas supply hole(403), a water supply hole(404), and a screw combination groove(405) are formed on an upper face of the base plate(400).
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