发明名称 PRESSURE SENSING DEVICE AND MANUFACTURING METHOD FOR SEMICONDUCTOR SUBSTRATE USED FOR IT
摘要 PROBLEM TO BE SOLVED: To provide a pressure sensing device with a thin profile that can be small-sized while maintaining high performance and to provide a manufacturing method for a semiconductor substrate used for the device. SOLUTION: By providing a back electrode 5 to a bottom side 4a of a recessed part 4 formed to the center of a major side 3a of the semiconductor substrate 3 and fixing a circumferential edge of a vibration electrode film 7 onto a circumferential surface 3c spread around the recessed part 4 a capacitor comprising the back electrode 5, a space 8 (air) and the vibration electrode film 7 are configured. Since etching is adopted to form the recessed part 4, dispersion in the depth of the recessed part 4 in respective devices can be suppressed, resulting that the inexpensive pressure sensing device with high reliability can be obtained.
申请公布号 JP2002345088(A) 申请公布日期 2002.11.29
申请号 JP20010149760 申请日期 2001.05.18
申请人 MITSUBISHI ELECTRIC CORP 发明人 NAKABAYASHI MASAKAZU
分类号 G01L9/12;H01L29/84;H04R7/18;H04R19/01;(IPC1-7):H04R19/01 主分类号 G01L9/12
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