发明名称 EVALUATING METHOD FOR SOI WAFER
摘要 PROBLEM TO BE SOLVED: To provide a method for evaluating crystal quality of an SOI wafer in which the crystal lattice of an SOI layer is equal to a substrate or similar to it. SOLUTION: Related to the method for evaluating an SOI wafer 1 where an SOI layer 14 is provided on a substrate 10, an element different from that which mainly constitutes the substrate 10 and the SOI layer 14 is diffused in the SOI layer 14 or the substrate, so that the crystal lattice of the SOI layer 14 is different from that of the substrate 10.
申请公布号 JP2002343948(A) 申请公布日期 2002.11.29
申请号 JP20010141592 申请日期 2001.05.11
申请人 SUMITOMO MITSUBISHI SILICON CORP 发明人 KUBO NOBUYUKI;HORIE HIROSHI
分类号 G01N23/20;H01L21/02;H01L21/22;H01L21/66;H01L27/12;(IPC1-7):H01L27/12 主分类号 G01N23/20
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