| 摘要 |
An apparatus or mounting an optical element in an optical system, in particular a mirror or a lens, in a projection exposure machine, in particular a projection lens in semiconductor lithography, is connected to an external base structure with the aid of at least three articulation sites that are arranged on the circumference of the optical element and at which a bearing device acts in each case, wherein the bearing device has at least one bending element, resembling a leaf spring, arranged tangentially to the optical element, and at least one bending element, resembling a leaf spring, arranged in the radial direction relative to the optical element.
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