| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical amplification type positive type resist composition having high resolution without impairing resist performances such as suitability to coating and sensitivity. SOLUTION: The chemical amplification type positive type resist composition contains (A) a resin which is made alkali-soluble by the action of an acid, such as a resin having a polymerization unit derived from a hydroxystyrene and a polymerization unit derived from 2-methyl-2-adamantyl (meth)acrylate or 2-ethyl-2-adamantyl (meth)acrylate, (B) an acid generator such as an onium salt, (C) a basic compound such as amines and (D) polycarboxylic esters such as adipic esters. |
