OPTICAL WAVEGUIDE FORMING METHOD, ELECTRODEPOSITION LIQUID USED FOR IT, AND OPTICAL WAVEGUIDE MANUFACTURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method for easily manufacturing an optical waveguide with good accuracy and with sufficient mass-productivity by using an electrodeposition process or an optical electrodeposition process by which a fine pattern having excellent resolution can be easily formed and little harmful waste liquid is produced, and its manufacturing apparatus. SOLUTION: This optical waveguide forming method contains a process for carrying out deposition formation of a material on a semiconductor thin film or an electrically conductive thin film by irradiating an optical semiconductor thin film with a light and applying voltage between the optical semiconductor thin film and a counter electrode, or applying voltage between an electrically conductive thin film and the counter electrode, in a state where the optical waveguide manufacturing substrate with the electrically conductive thin film and the optical semiconductor thin film, or the electrically conductive thin film stacked on the insulating substrate is placed to an electrodeposition liquid of the water system including a film formation material in which solubility or diffusivity to the aqueous liquid is lowered by the change of pH so that the optical semiconductor thin film or the electrically conductive thin film may be brought into contact with the electrodeposition liquid, or the process which further transfers the deposited material to other substrates.