发明名称 FORMING METHOD OF PLATING-SUBSTITUTE CONDUCTIVE METAL FILM USING METAL FINE PARTICLE DISPERSED LIQUID
摘要 PROBLEM TO BE SOLVED: To provide a method of forming simply and in high reproducibility a conductive metal film which can be substituted for various plating films for various uses in an electronic component material field having process accuracy and reliability comparable to a plating film. SOLUTION: Extra-fine metal particles with average particle diameter of 100 nm or less are dispersed in an organic solvent with coating layer of an amine compound or the like capable of coordinate bonding with metal element, a coating film is formed with the use of paste-like dispersion liquid with the addition of organic acid anhydride or its derivative or organic acid or the like showing reactivity with the amine compound or the like of the coating layer, and then, is put under heat treatment at 250 deg.C or less, to manufacture a metal film with metal extra-fine particles densely sintered.
申请公布号 JP2002334618(A) 申请公布日期 2002.11.22
申请号 JP20010136077 申请日期 2001.05.07
申请人 HARIMA CHEM INC 发明人 HATA NORIAKI;UEDA MASAYUKI;GOTO HIDEYUKI;MATSUBA YORISHIGE
分类号 H05K1/09;B22F1/02;C09D1/00;C09D5/24;C23C24/08;H01B1/00;H01B1/22;H01B13/00;(IPC1-7):H01B13/00 主分类号 H05K1/09
代理机构 代理人
主权项
地址