发明名称 SUBSTRATE TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment device that can be installed in a minimum space and has a lid opening/closing mechanism capable of opening or closing a lid with a small force and in high positional accuracy. SOLUTION: This substrate treatment device comprises a chamber 2, an openable and closable lid 1 of the chamber 2, and the opening/closing mechanism of the lid 1. The opening/closing mechanism of the lid 1 comprises a plurality of arms 4, 5, and 6 and a plurality of joints 8, 9, 10, and 11, one end of the first arm 4 of the plurality of arms 4, 5, and 6 is connected to the chamber 2 via the joint 8, one end of the second arm 5 is connected to the other end of the first arm 4 via the joint 9, and the other end of the second arm 5 is connected to the lid 1 via the joint 10.
申请公布号 JP2002332116(A) 申请公布日期 2002.11.22
申请号 JP20010138408 申请日期 2001.05.09
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 NAKAJIMA MASAYO
分类号 B65G49/00;H01L21/02;(IPC1-7):B65G49/00 主分类号 B65G49/00
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