发明名称 |
A METHOD FOR PRODUCING A METAL FILM, A THIN FILM DEVICE HAVING SUCH METAL FILM AND A LIQUID CRYSTAL DISPLAY DEVICE HAVING SUCH THIN FILM DEVICE |
摘要 |
The invention provides a method for forming a metal film for a thin film device so as to have certain gentle taper angles. The method is an improved fine work method to produce metal films such as light shutter films for thin film devices through the combined production method of a wet-etching step and a dry-etching step. Preliminarily, the cross sectional shape of the resist film is formed so as to have certain taper angles at both end portions. Accordingly, during the dry-etching step, an etchant gas can smoothly flow through along the sidewall of the resist and accordingly the metal film can be formed so as to have gentle taper angles along the flow line of the etchant gas. Thus, it is possible in accordance with the invention to significantly improve the production efficiency and the quality of such thin film devices as the TFTs to be used for the LCDs. |
申请公布号 |
WO0215252(A3) |
申请公布日期 |
2002.11.21 |
申请号 |
WO2001EP08925 |
申请日期 |
2001.08.02 |
申请人 |
KONINKLIJKE PHILIPS ELECTRONICS N.V. |
发明人 |
HATTA, YOSHIHISA;MATSUMOTO, AKINORI;LI, SHINICHI |
分类号 |
G02F1/1335;G02F1/136;G02F1/1368;G03F7/38;H01L21/027;H01L21/28;H01L21/302;H01L21/306;H01L21/3065;H01L21/3213;H01L21/336;H01L29/417;H01L29/423;H01L29/45;H01L29/49;H01L29/786 |
主分类号 |
G02F1/1335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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