MASK AND PRODUCTION METHOD THEREFOR, OPTICAL ELEMENT AND PRODUCTION METHOD THEREFOR, AND ILLUMINATING OPTICDAL DEVICE PROVIDED WITH THE OPTICAL ELEMENT AND EXPOSURE SYSTEM

摘要

A method of producing a diffraction optical element capable of efficiently converting an incident light flux into a light flux having a specified section shape. A specified light flux section is divided to obtain a plurality of first light flux section portion areas (S11). A total of lengths of the plurality of first light flux section portion areas is calculated (S12), and the total length is equally divided to obtain a specified unit length (S13). A plurality of second light flux section portion areas are obtained based on the specified unit length (S14). A specified optical element is divided into a plurality of partial optical elements using coordinate data on a specified optical element corresponding to the coordinates of a plurality of second light flux section portion areas (S15). A plurality of partial optical elements are densely disposed to constitute a basic optical element (S16).