发明名称 |
Positive photoresist composition |
摘要 |
A positive photoresist composition comprising the components of: (a) a resin which decomposes by the action of an acid, thereby having an increased solubility in an alkali developer; and (b) a compound which is represented by the formula (1) and generates an acid by exposure to active rays or radiation, and a compound which is represented by the formula (2) and generates an acid by exposure to active rays or radiation.
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申请公布号 |
US2002172886(A1) |
申请公布日期 |
2002.11.21 |
申请号 |
US20020097983 |
申请日期 |
2002.03.15 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
MOMOTA MAKOTO;KAWABE YASUMASA |
分类号 |
C08K5/41;C08L101/00;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/004;G03F7/30 |
主分类号 |
C08K5/41 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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