| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which has a wide defocus latitude when ring-zone lighting is used and which hardly generates the side lobes when a pattern is formed by using a halftone phase shift mask, and moreover, to provide a positive photosensitive composition which hardly produces particles during stored with time. SOLUTION: The positive photosensitive composition contains (A) an acid producing agent which produces acids by irradiation of active rays or radiation, (B) a resin which has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the effect of acids to increase the solubility in an alkali developer, (C) a basic compound and (D) a fluorine and/or silicon-based surfactant. The acid producing agent (A) is a mixture containing at least one kind of triaryl sulfonium salt and at least one kind of compound having a phenacyl sulfonium salt structure. |
