| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an electron beam analyzer which solves the problem of an irradiation region associated with conventional electron beam analyzer, and by which sufficiently high resolution can be obtained in a short analytical time and which reduces irregularities due to the position of the resolution. SOLUTION: In the electron beam analyzer 1, an electron beam is scanned with reference to a sample, and the sample is subjected to mapping analysis. By using analytical data in each irradiation position of the electron beam, an interpolation computing operation or an extrapolation computing operation is conducted, analytical data in positions other than each irradiation position is interposed, and analytical data for a mapping display is increased. When the change state of the analytical data is found by using the analytical data in the irradiation position of the electron beam, additional irradiation position other than the irradiation position is calculated, the additional irradiation position is irradiated with the electron beam, the analytical data is interpolated, and the analytical data for the mapping display is increased.</p> |
