发明名称 |
THIN-FILM TRANSISTOR AND METHOD OF FORMING THE SAME |
摘要 |
<p>PROBLEM TO BE SOLVED: To prevent electric corrosion caused by contact of a pixel electrode and a drain electrode without increasing the number of processes, in a thin-film transistor wherein Al or Al alloy is included in the uppermost layer of the drain electrode and the pixel electrode is constituted of ITO. SOLUTION: The thin-film transistor comprises an electrode 105b for contact formed on the same layer as a gate electrode 105a, a passivation film 109 formed on the drain electrode, and a contact hole 109b extended from the uppermost surface of a flattening film 110 to the electrode for contact. The electrode for contact is connected to the drain region of a semiconductor layer via the drain electrode. The pixel electrode 11 formed on the flattened film is connected to the electrode for contact through the contact hole.</p> |
申请公布号 |
JP2002324904(A) |
申请公布日期 |
2002.11.08 |
申请号 |
JP20010125730 |
申请日期 |
2001.04.24 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
YOSHIOKA TATSUO |
分类号 |
G02F1/1368;G09F9/30;H01L21/3205;H01L21/336;H01L21/768;H01L23/52;H01L23/522;H01L29/786;(IPC1-7):H01L29/786;G02F1/136;H01L21/320 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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