METHOD FOR PRODUCING EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES

摘要

A method for forming EUV Lithography large dimension homogeneous glass body is disclosed which includes delivering a silica precursor (28) to a burner (16) and passing the silica precursor (16) through the flame (36) of the burner (16) to form silica particles (38), depositing the silica particles (38) on a planar surface (14) to form a flat porous EUV Lithography large dimension preform (40) and consolidating the flat porous EUV Lithography large dimension preform (40) into a flat dense EUV Lithography large dimension homogeneous glass body.